- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/035 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
Patent holdings for IPC class G03F 7/035
Total number of patents in this class: 113
10-year publication summary
|
7
|
11
|
10
|
8
|
8
|
6
|
3
|
6
|
5
|
0
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Covestro Deutschland AG | 2429 |
26 |
| FUJIFILM Corporation | 27102 |
18 |
| LG Chem, Ltd. | 17205 |
8 |
| Kaneka Corporation | 4445 |
7 |
| Bayer MaterialScience AG | 874 |
6 |
| Eastman Kodak Company | 3444 |
4 |
| Taiyo Ink Mfg. Co., Ltd. | 219 |
4 |
| Bayer Intellectual Property GmbH | 2671 |
3 |
| Taiyo Holdings Co., Ltd. | 221 |
3 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
3 |
| Showa Denko K.K. | 2539 |
2 |
| Korea Advanced Institute of Science and Technology | 3906 |
2 |
| Nissan Chemical Industries, Ltd. | 1822 |
2 |
| Rohm and Haas Electronic Materials LLC | 637 |
2 |
| Toyobo Co., Ltd. | 2286 |
2 |
| MacDermid Graphics Solutions, LLC | 125 |
2 |
| Evonik Operations GmbH | 3879 |
2 |
| BASF SE | 19740 |
1 |
| Merck Patent GmbH | 5909 |
1 |
| Samsung SDI Co., Ltd. | 6671 |
1 |
| Other owners | 14 |